Document Type

Post-Print

Publication Date

8-2011

Subjects

Electron beam lithography, Scanning electron microscopy

Abstract

Controlled deposition of metal nanoparticles (NPs) into lithographic patterned nanoholes has been a major challenge. Electrostatic attraction was employed in directing gold NPs of precise size into e-beam lithographically patterned holes. Citrate stabilized gold NPs with a net negative surface charge were deposited on a positively charged well-bottom surface generated by adsorption of long-chain amino-terminated organosilane N-(2-aminoethyl)-11-aminoundecyltrimethoxy- silane (AATMS). Scanning electron microscopy (SEM) results indicate that deposition of NPs into patterned holes is a function of deposition time and NPs concentration. Other factors affecting NP fill fraction are thickness of silane and resist layer and spacing between the nanoholes.

Description

This is the author's accepted manuscript. © 2011 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.

Presented at the IEEE Nano 2011 Conference, in Portland, OR

DOI

10.1109/NANO.2011.6144458

Persistent Identifier

http://archives.pdx.edu/ds/psu/12020

Included in

Chemistry Commons

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