This work was supported by Intel corporation grant number 414305 and Oregon Nanotechnology and Microtechnology Initiative (ONAMI).
Electron beam lithography, Scanning electron microscopy
Controlled deposition of metal nanoparticles (NPs) into lithographic patterned nanoholes has been a major challenge. Electrostatic attraction was employed in directing gold NPs of precise size into e-beam lithographically patterned holes. Citrate stabilized gold NPs with a net negative surface charge were deposited on a positively charged well-bottom surface generated by adsorption of long-chain amino-terminated organosilane N-(2-aminoethyl)-11-aminoundecyltrimethoxy- silane (AATMS). Scanning electron microscopy (SEM) results indicate that deposition of NPs into patterned holes is a function of deposition time and NPs concentration. Other factors affecting NP fill fraction are thickness of silane and resist layer and spacing between the nanoholes.
Morakinyo, Moshood K. and Rananavare, Shankar B., "Positional Control Over Nanoparticle Deposition into Nanoholes" (2011). Chemistry Faculty Publications and Presentations. 84.