Published In

Journal of Applied Physics

Document Type

Article

Publication Date

10-1-1971

Subjects

Electrons -- Scattering, Field emission

Abstract

Comments are made on the model of electron injection into SiO₂ proposed by Berglund and Powell. Their assumptions on electron scattering, disregarding the change of the escape cone with the distance from the emitter, lead to serious underestimation of the injected current. Two alternative models of electron injection, based solely on elastic scattering are discussed and do not predict the experimental results. We suggest that observed field dependence of the injected current into SiO₂ indicates that energy relaxation associated with the injected electrons is responsible for the voltage dependence of the current.

Description

This is the publisher's final pdf. Article appears in Journal of Applied Physics (http://jap.aip.org/) and is copyrighted 1972 by the American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

DOI

10.1063/1.1661524

Persistent Identifier

http://archives.pdx.edu/ds/psu/8369

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