Document Type

Closed Project

Publication Date

Spring 1993

Instructor

Richard R. Deckro

Course Title

Total Quality Management

Course Number

EMGT 510

Abstract

This project developed a characterization and process control plan for a new plasma photo resist stripper as part of the overall continuous improvement effort in the photo resist/ion implant sequence.

Description

This project is only available to students, staff, and faculty of Portland State University.

Persistent Identifier

http://archives.pdx.edu/ds/psu/22927

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