Document Type

Closed Project

Publication Date

Spring 1993

Instructor

Richard R. Deckro

Course Title

Total Quality Management

Course Number

EMGT 510

Abstract

This project developed a characterization and process control plan for a new plasma photo resist stripper as part of the overall continuous improvement effort in the photo resist/ion implant sequence.

Rights

In Copyright. URI: http://rightsstatements.org/vocab/InC/1.0/ This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).

Comments

This project is only available to students, staff, and faculty of Portland State University.

Persistent Identifier

http://archives.pdx.edu/ds/psu/22927

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