First Advisor
Erik Sánchez
Date of Award
Winter 3-22-2024
Document Type
Thesis
Degree Name
Bachelor of Science (B.S.) in Physics and University Honors
Department
Physics
Language
English
Subjects
Spectroscopic, e-beam, evaporator, Physical Vapor Deposition, coating
Abstract
Spectroscopic end point detection is a common tool used for measuring slope changes in wavelength intensity. Using algorithms able to apply this concept, coatings will be able to be dynamically measured in real time and stopped at the appropriate level to ensure process uniformity. It is currently applied to reductive processes such as etching, where the surface will start to be eaten away, creating a plasma. When the entire amount of a material on a substrate has been eaten away, the plasma will change color as it is beginning to etch a different material. Using a spectrometer, this point where the plasma changes color can be found, and the process stopped. This paper explores an analysis of its application in additive coating processes, specifically with an Electron Beam Evaporator (E-beam). Herein, an analysis of the subsystems required for an E-Beam to operate successfully are provided as well as discussions for how the concept of spectroscopic end point detection can be added to a functioning E-beam or any coating system.
Persistent Identifier
https://archives.pdx.edu/ds/psu/41493
Recommended Citation
McGraw, Ryan, "Spectroscopic End Point Detection With an Electron Beam Evaporator" (2024). University Honors Theses. Paper 1435.
Included in
Atomic, Molecular and Optical Physics Commons, Optics Commons, Other Physics Commons, Plasma and Beam Physics Commons