Document Type
Closed Project
Publication Date
Spring 2001
Instructor
Dragan Milosevic
Course Title
Total Quality Management
Course Number
EMGT 560/660
Subjects
Semiconductor industry -- Management, Production engineering, Process control -- Statistical methods, Semiconductors -- Measurement -- Data processing
Abstract
This project is to explore the use of Statistical Process Control (SPC), in particular the Exponentially Weighted Moving Average (EWMA), to ensure continues improvement in a chemical process. Particular interest in this study is to see how well analytical machines would measure the wafer thickness. EWMA requires that all past information is gathered with more weight given to the most recent data. In conclusion, the data under study reveals that EWMA is an effective way in controlling and detecting whether or not the moving target operates within the process limit and thus, confirm the reliability of the measurements by the machines.
Rights
In Copyright. URI: http://rightsstatements.org/vocab/InC/1.0/ This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).
Persistent Identifier
http://archives.pdx.edu/ds/psu/24782
Citation Details
Lubis, Ahmad; Cosmedy, Ferry; Khalaf, Rami; Boonbutra, Ravee; and Amadani, Taha, "Process Improvement of Wafer Measurement in the Semiconductor Industry" (2001). Engineering and Technology Management Student Projects. 2135.
http://archives.pdx.edu/ds/psu/24782
Comments
This project is only available to students, staff, and faculty of Portland State University