Document Type
Closed Project
Publication Date
Summer 2001
Instructor
Dilek Cetindamar
Course Title
Economics of Technology Innovation
Course Number
EMGT 510/610
Subjects
Extreme ultraviolet lithography -- Industrial applications, Technological innovations -- Management, Engineering -- Management
Abstract
It is generally recognized by economist and policy makers that new technology will be the driving force in our economy. With the greatest need for high-speed computing, better memory storage application and the development of micro-electrical-mechanical structures, a lithography technology is needed to realize such objectives. It is the main reason why a consortium composed of big names in the semiconductor industry was established in order to transform the benefits of Extreme Ultraviolet Lithography technology into a commercial application.
Rights
In Copyright. URI: http://rightsstatements.org/vocab/InC/1.0/ This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).
Persistent Identifier
http://archives.pdx.edu/ds/psu/24810
Citation Details
Lubis, Ahmad; Mulia, Farolan; Patdu, Archie; and Takeshita, Atsunobu, "Extreme Ultraviolet Lithography" (2001). Engineering and Technology Management Student Projects. 2155.
http://archives.pdx.edu/ds/psu/24810
Comments
This project is only available to students, staff, and faculty of Portland State University