First Advisor

Shankar Rananavare

Date of Award

6-13-2021

Document Type

Thesis

Degree Name

Bachelor of Science (B.S.) in Chemistry and University Honors

Department

Chemistry

Language

English

DOI

10.15760/honors.1134

Abstract

Soft lithography is a well-established route to wafer-scale reproduction of micro- and nanoscale features in a wide variety of materials. Nevertheless, micron length scales have yet to be explored, despite the potential utility of such structures. Here, polymer micropillars of 6-12 μm length, approximately 0.5-1.5 μm wide at 10 μm spacing are reproduced from a polydimethylsiloxane (PDMS) mold made from patterned cellulose acetate (CA). The patterned CA was cast from a rigid fused silica template machined by a pulsed femtosecond laser. Pore topographic features were successfully reproduced in Norland Optical Adhesive (NOA), polycaprolactone (PCL), Nafion, acrylonitrile butadiene styrene (ABS), and CA, with a length scale of 7.7 to 13.5 μm.

Rights

In Copyright. URI: http://rightsstatements.org/vocab/InC/1.0/ This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).

Persistent Identifier

https://archives.pdx.edu/ds/psu/35902

Available for download on Sunday, June 12, 2022

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