Sponsor
This work was supported in part by the NSF under Grant No. CBET-0651780, the start-up funds from the University of Florida, and the UF Research Incentive Seed Fund.
Published In
Applied Physics Letters
Document Type
Article
Publication Date
12-1-2007
Subjects
Silicon solar cells, Optical coatings -- Design and construction, Monomolecular films, Nanostructures
Abstract
We report a cheap and scalable bottom-up technique for fabricating wafer-scale, subwavelength-structured antireflection coatings on single-crystalline silicon substrates. Spin-coated monolayer colloidal crystals are utilized as shadow masks to generate metallic nanohole arrays. Inverted pyramid arrays in silicon can then be templated against nanoholes by anisotropic wet etching. The resulting subwavelength gratings greatly suppress specular reflection at normal incidence. The reflection spectra for flat silicon and the templated gratings at long wavelengths agree well with the simulated results using a rigorous coupled wave analysis model. These subwavelength gratings are of great technological importance in crystalline silicon solar cells.
DOI
10.1063/1.2821833
Persistent Identifier
http://archives.pdx.edu/ds/psu/7279
Citation Details
Sun, C., Min, W., Linn, N. C., Jiang, P., & Jiang, B. (2007). Templated fabrication of large area subwavelength antireflection gratings on silicon. Applied Physics Letters, 91(23), 231105
Description
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