Sponsor
Portland State University. Department of Physics
Advisor
John Dash
Date of Award
1985
Document Type
Thesis
Degree Name
Master of Science (M.S.) in Physics
Department
Physics
Physical Description
1 online resource (107 p.)
Subjects
Copper Electrodeposition, Magnetic field, Surface morphology, Crystal orientation, MHD
DOI
10.15760/etd.5438
Abstract
The effect of a magnetic field on copper electrodeposition was investigated. Copper was electrodeposited onto square copper cathodes 1 sq cm in area from an aqueous solution (0.5 M CuSO4, 0.5 M H2SO. A glass cell was placed between the pole pieces of an electromagnet, and the magnetic fields applied were in the range from 0 to 12.5 kG. The current density was in the range from 80 mA/sq cm to 880 mA/sq cm. In each of the experiments, cell current, cell voltage, and cell temperature were monitored with a microcomputer. The weight change, deposit surface and cross section morphology, and the hardness were also found. Anodes used in the experiments were studied to see the effect of various conditions on the surface finish. Copper was also electrodeposited onto copper grids in order to study how the uniformity of the deposit is affected by an applied magnetic field.
Persistent Identifier
http://archives.pdx.edu/ds/psu/20093
Recommended Citation
Takeo, Hiroshi, "Copper electrodeposition in a magnetic field" (1985). Dissertations and Theses. Paper 3550.
https://pdxscholar.library.pdx.edu/open_access_etds/3550
10.15760/etd.5438
Description
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