Sponsor
This investigation was supported in part by the Office of Naval Research through Oregon Nanoscience and Microtechnologies Institute ONAMI.
Published In
Applied Physics Letters
Document Type
Article
Publication Date
4-12-2010
Subjects
Graphene films, Nanostructured materials
Abstract
Single and multiple layers of graphene films were grown on 111 oriented single crystals of nickel and polycrystalline nickel films using remote plasma assisted chemical vapor deposition. Remote plasma was employed to eliminate the effect of the plasma electrical field on the orientation of the grown graphene films, as well as to reduce the growth temperature compared to conventional chemical vapor deposition. The electrical and optical properties, including high resolution transmission electron microscopy of these films, suggest that this approach is both versatile and scalable for potential large area optoelectronic applications.
DOI
10.1063/1.3387812
Persistent Identifier
http://archives.pdx.edu/ds/psu/7183
Citation Details
Nandamuri, G., Roumimov, S., & Solanki, R. (2010). Remote plasma assisted growth of graphene films. Applied Physics Letters, 96(15), 154101
Description
© 2010 AIP Publishing LLC. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Applied Physics Letters and may be found at: http://dx.doi.org/10.1063/1.3387812