Scanning probe microscopy -- Data processing, Metrology -- Standards, Image processing, Crystals -- Structure
Nanometrology device standards and methods for fabricating and using such devices in conjunction With scanning probe microscopes are described. The fabrication methods comprise: (1) epitaxial growth that produces nanometer sized islands of knoWn morphology, structural, morphological and chemical stability in typical nanometrology environments, and large height-to-width nano-island aspect ratios, and (2) marking suitable crystallographic directions on the device for alignment With a scanning direction.
Moeck, Peter. "Nanometrology device standards for scanning probe microscopes and processes for their fabrication and use." U.S. Patent No. 7,472,576. 6 Jan. 2009.