Sponsor
This work was supported by Intel corporation grant number 414305 and Oregon Nanotechnology and Microtechnology Initiative (ONAMI).
Document Type
Post-Print
Publication Date
8-2011
Subjects
ENanostructures, Nanoparticles, Gold, Electrostatics, Electron beam lithography, Scanning electron microscopy
Abstract
Controlled deposition of metal nanoparticles (NPs) into lithographic patterned nanoholes has been a major challenge. Electrostatic attraction was employed in directing gold NPs of precise size into e-beam lithographically patterned holes. Citrate stabilized gold NPs with a net negative surface charge were deposited on a positively charged well-bottom surface generated by adsorption of long-chain amino-terminated organosilane N-(2-aminoethyl)-11-aminoundecyltrimethoxy- silane (AATMS). Scanning electron microscopy (SEM) results indicate that deposition of NPs into patterned holes is a function of deposition time and NPs concentration. Other factors affecting NP fill fraction are thickness of silane and resist layer and spacing between the nanoholes.
DOI
10.1109/NANO.2011.6144458
Persistent Identifier
http://archives.pdx.edu/ds/psu/12020
Citation Details
Morakinyo, Moshood K. and Rananavare, Shankar B., "Positional Control Over Nanoparticle Deposition into Nanoholes" (2011). Chemistry Faculty Publications and Presentations. 84.
http://archives.pdx.edu/ds/psu/12020
Description
This is the author's accepted manuscript. © 2011 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
Presented at the IEEE Nano 2011 Conference, in Portland, OR