Consistency in Wafer Based Outlier Screening

Authors

Sebastian Siatkowski, University of California, Santa Barbara
Chuanhe Jay Shan, University of California, Santa Barbara
Li-C. Wang, University of California, Santa Barbara
Nikolas Sumikawat, Freescale Semiconductor, Inc.
W. Rober Daasch, Portland State UniversityFollow
John M. Carulli, GlobalFoundries

Published In

VLSI Test Symposium (VTS), 2016 IEEE 34th

Document Type

Citation

Publication Date

5-26-2016

Abstract

Outlier screening is a popular approach for testing automotive products. In practice, developing an outlier model can be subjective, making justification of the model challenging. In this paper we propose a new concept called Consistency which provides a data-driven objective way to assess an outlier model. We study the development of outlier models in view of this new model consistency concept and report experimental findings on an automotive product line.

Locate the Document

https://doi.org/10.1109/VTS.2016.7477267

DOI

10.1109/VTS.2016.7477267

Persistent Identifier

http://archives.pdx.edu/ds/psu/20206

Citation Details

S. Siatkowski, C. J. Shan, L. C. Wang, N. Sumikawat, W. R. Daasch and J. M. Carulli, "Consistency in wafer based outlier screening," 2016 IEEE 34th VLSI Test Symposium (VTS), Las Vegas, NV, 2016, pp. 1-6.