Sponsor
Portland State University. Department of Mechanical Engineering
First Advisor
Hormoz Zarefar
Term of Graduation
Summer 1990
Date of Publication
9-4-1990
Document Type
Thesis
Degree Name
Master of Science (M.S.) in Mechanical Engineering
Department
Mechanical Engineering
Language
English
Subjects
Semiconductors -- Thermal properties, Thermal stresses
DOI
10.15760/etd.6099
Physical Description
1 online resource (2, ix, 46 pages)
Abstract
The failure of integrated circuit due to Silicon fracture is one of the problems associated with the production of a semiconductor device. The thermal stresses, which result in die cracking, are for the most part induced during the cooling process after attaching the die with Gold-Silicon solder. Major factors for stress generation in material systems are commonly large temperature gradients and substantial difference in coefficients of thermal expansion.
This research covers the thermal stresses introduced upon cooling a composite Silicon device. A transient thermal analysis has been performed to determine the temperature gradients. The stress distribution has been investigated. For both analyses the Finite Element Method has been applied. Various parameters such as center and edge voids as well as varying thickness of the Eutectic layer have been taken into account.
The magnitude of the induced stresses was found to increase with increasing thickness of the eutectic layer. Center voids induce a new area of high stresses which can exceed the stresses at the edge of the device. Edge voids change the stress distribution and increase the tensile stresses in the top surface of the device. Thermal stresses due· to nonuniform cooling of the device were found to be insignificant. The probability of die cracking depends mainly on the magnitude of the residual stresses and on the quality of the surfaces and edges of the die.
Rights
In Copyright. URI: http://rightsstatements.org/vocab/InC/1.0/ This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).
Persistent Identifier
https://archives.pdx.edu/ds/psu/24352
Recommended Citation
Duerr, Joachim Karl Wilhelm, "Finite Element Analysis of Thermal Stresses in Semiconductor Devices" (1990). Dissertations and Theses. Paper 4215.
https://doi.org/10.15760/etd.6099
Comments
If you are the rightful copyright holder of this dissertation or thesis and wish to have it removed from the Open Access Collection, please submit a request to pdxscholar@pdx.edu and include clear identification of the work, preferably with URL.